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Proceedings Paper

Role of CDAFM in achieving accurate OPC modeling
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Paper Abstract

Accuracy of patterning strongly impacts profit of IC manufacturing and depends on accuracy of optical proximity correction (OPC) and resolution enhancement technology (RET) models. Despite its importance accuracy of RET and OPC is not known in most cases. Accuracy of CDSEM which is used to build the models is questionable. Sample-to-sample bias variation of CDSEM is exceeding required sub-nanometer uncertainty budget. CDAFM could be used for reference and bias correction. Use of AFM in several areas of RET and OPC modeling is discussed. Accurate inputs and feedback during development reduce number of learning cycles and improve quality of the models.

Paper Details

Date Published: 23 March 2009
PDF: 8 pages
Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 727205 (23 March 2009); doi: 10.1117/12.815240
Show Author Affiliations
Vladimir A. Ukraintsev, Veeco Instruments Inc. (United States)

Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

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