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Proceedings Paper

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
Author(s): Kafai Lai; Alan E. Rosenbluth; Saeed Bagheri; John Hoffnagle; Kehan Tian; David Melville; Jaione Tirapu-Azpiroz; Moutaz Fakhry; Young Kim; Scott Halle; Greg McIntyre; Alfred Wagner; Geoffrey Burr; Martin Burkhardt; Daniel Corliss; Emily Gallagher; Tom Faure; Michael Hibbs; Donis Flagello; Joerg Zimmermann; Bernhard Kneer; Frank Rohmund; Frank Hartung; Christoph Hennerkes; Manfred Maul; Robert Kazinczi; Andre Engelen; Rene Carpaij; Remco Groenendijk; Joost Hageman; Carsten Russ
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Paper Abstract

We demonstrate experimentally for the first time the feasibility of applying SMO technology using pixelated illumination. Wafer images of SRAM contact holes were obtained to confirm the feasibility of using SMO for 22nm node lithography. There are still challenges in other areas of SMO integration such as mask build, mask inspection and repair, process modeling, full chip design issues and pixelated illumination, which is the emphasis in this paper. In this first attempt we successfully designed a manufacturable pixelated source and had it fabricated and installed in an exposure tool. The printing result is satisfactory, although there are still some deviations of the wafer image from simulation prediction. Further experiment and modeling of the impact of errors in source design and manufacturing will proceed in more detail. We believe that by tightening all kind of specification and optimizing all procedures will make pixelated illumination a viable technology for 22nm or beyond. Publisher's Note: The author listing for this paper has been updated to include Carsten Russ. The PDF has been updated to reflect this change.

Paper Details

Date Published: 16 March 2009
PDF: 12 pages
Proc. SPIE 7274, Optical Microlithography XXII, 72740A (16 March 2009); doi: 10.1117/12.814680
Show Author Affiliations
Kafai Lai, IBM Microelectronics (United States)
Alan E. Rosenbluth, IBM Yorktown Research Ctr. (United States)
Saeed Bagheri, IBM Microelectronics (United States)
John Hoffnagle, IBM Almaden Research Ctr. (United States)
Kehan Tian, IBM Microelectronics (United States)
David Melville, IBM Yorktown Research Ctr. (United States)
Jaione Tirapu-Azpiroz, IBM Microelectronics (United States)
Moutaz Fakhry, Mentor Graphics Corp. (United States)
Young Kim, IBM Almaden Research Ctr. (United States)
Scott Halle, IBM Microelectronics (United States)
Greg McIntyre, IBM Microelectronics (United States)
Alfred Wagner, IBM Yorktown Research Ctr. (United States)
Geoffrey Burr, IBM Almaden Research Ctr. (United States)
Martin Burkhardt, IBM Yorktown Research Ctr. (United States)
Daniel Corliss, IBM Microelectronics (United States)
Emily Gallagher, IBM Mask House (United States)
Tom Faure, IBM Mask House (United States)
Michael Hibbs, IBM Mask House (United States)
Donis Flagello, ASML US, Inc. (United States)
Joerg Zimmermann, Carl Zeiss SMT AG (Germany)
Bernhard Kneer, Carl Zeiss SMT AG (Germany)
Frank Rohmund, Carl Zeiss SMT AG (Germany)
Frank Hartung, Carl Zeiss SMT AG (Germany)
Christoph Hennerkes, Carl Zeiss SMT AG (Germany)
Manfred Maul, Carl Zeiss SMT AG (Germany)
Robert Kazinczi, ASML (Netherlands)
Andre Engelen, ASML (Netherlands)
Rene Carpaij, ASML (Netherlands)
Remco Groenendijk, ASML (Netherlands)
Joost Hageman, ASML (Netherlands)
Carsten Russ, Formerly Carl Zeiss SMT AG (Germany)

Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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