We report the demonstration of Extreme Ultraviolet Holographic Lithography - EUV-HL - using a compact table top extreme ultraviolet laser. The image of the computer-generated hologram (CGH) of a test pattern was projected on the surface of a sample coated with a high resolution photoresist. Features with a 140 nm pixel size were printed using for the reconstruction a highly coherent table top 46.9 nm extreme ultraviolet laser. We have demonstrated that the combination of a coherent EUV source with a nanofabricated CGH template allows for the extension of nanolithography in an extremely simple set up that requires no optics. The reconstructed image of CGH was digitized with an atomic force microscope, yielding to reconstructions that are in excellent agreement with the numerical predictions.

Date Published: 18 March 2009
PDF: 6 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72713O (18 March 2009); doi: 10.1117/12.814678

Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)