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Proceedings Paper

Innovative pixel-inversion calculation for model-based sub-resolution assist features and optical proximity correction
Author(s): Jue-Chin Yu; Peichen Yu; Hsueh-Yung Chao
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Paper Abstract

We propose an inversion calculation method based on a simple "pixel-flipping" approach. The simple method features innovative wavefront-expansion and wavefront-based damping techniques in order to obtain accentuated corrections near the drawn pattern. The method is first employed to be a stand-alone optical proximity correction solution that directly calculates the corrected masks with acceptable contours and image contrast. In addition, a model-based pre-OPC flow, where the initial sizing of drawn patterns and surrounding sub-resolution assist features (SRAF) are simultaneously generated in a single iteration using this inversion calculation is also proposed to minimize technology-transition risks and costs. A mask simplification technique based on the central moments is introduced in order to snap the corrections into 45 degree and axis-aligned line segments. This approach allows achieving optimized corrections while minimizing the impact to the existing and validated correction flow.

Paper Details

Date Published: 16 March 2009
PDF: 12 pages
Proc. SPIE 7274, Optical Microlithography XXII, 72743B (16 March 2009); doi: 10.1117/12.814413
Show Author Affiliations
Jue-Chin Yu, National Chiao-Tung Univ. (Taiwan)
Peichen Yu, National Chiao-Tung Univ. (Taiwan)
Hsueh-Yung Chao, National Chiao-Tung Univ. (Taiwan)

Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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