An algorithm is presented which performs a model-based colouring of a given layout for double patterning. The algorithm searches the space of patterns which can be printed with a particular wavelength and numerical aperture, and seeks to find a pair of patterns which combine to produce the desired target layout. This is achieved via a cost function which encodes the geometry of the layout and allowable edge placement tolerances. If the layout is not printable by double patterning, then the algorithm provides a closest solution and indicates hotspots where the target is not feasible.

Date Published: 12 March 2009
PDF: 12 pages
Proc. SPIE 7275, Design for Manufacturability through Design-Process Integration III, 72750O (12 March 2009); doi: 10.1117/12.814321

Published in SPIE Proceedings Vol. 7275:
Design for Manufacturability through Design-Process Integration III
Vivek K. Singh; Michael L. Rieger, Editor(s)