
Proceedings Paper
Pattern matching assisted modeling test pattern generationFormat | Member Price | Non-Member Price |
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Paper Abstract
Generating test patterns with sufficient parameter space coverage has always been one of the critical steps towards
building good OPC models. The advancement in technology node requires continues updates to OPC modeling test
patterns. The traditional approach relies heavily on experiences gathered from older technology nodes. It often requires
rounds of costly test tape out. Here we propose an automated flow for test pattern generation utilizing a fast full chip
pattern matching algorithm. We describe the implementation of the flow. We also present experimental results and
discuss the benefit and challenges of the proposed flow.
Paper Details
Date Published: 16 March 2009
PDF: 10 pages
Proc. SPIE 7274, Optical Microlithography XXII, 727429 (16 March 2009); doi: 10.1117/12.814302
Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)
PDF: 10 pages
Proc. SPIE 7274, Optical Microlithography XXII, 727429 (16 March 2009); doi: 10.1117/12.814302
Show Author Affiliations
Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)
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