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Proceedings Paper

New inspection technology for hole pattern by Fourier space on hp 4x-nm generation
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Paper Abstract

We tried to detect the CD variation of the 4x generation hole pattern using the diffraction light on Fourier space with the polarized light and the modified illumination. The new technology named DD (Dual Diffraction) method has been developed based on the optical simulation and the experimental approaches. We introduce the case of detection for the diameter variation on a multi-layered hole pattern with new method.

Paper Details

Date Published: 23 March 2009
PDF: 8 pages
Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 727219 (23 March 2009); doi: 10.1117/12.814046
Show Author Affiliations
Akitoshi Kawai, Nikon Corp. (Japan)
Fuminori Hayano, Nikon Corp. (Japan)
Kazumasa Endo, Nikon Corp. (Japan)
Kiminori Yoshino, Toshiba Corp. (Japan)
Yuichiro Yamazaki, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

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