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Proceedings Paper

Atomic processes in the LPP and LA-DPP EUV sources
Author(s): Akira Sasaki; Katsunobu Nishihara; Atsushi Sunahara; Hiroyuki Furukawa; Takeshi Nishikawa; Fumihiro Koike
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Paper Abstract

We investigate characteristic feature of the atomic radiation from tin plasmas, which allow one to obtain high power EUV emission at λ=13.5nm efficiently. We develop a collisional radiative model of tin ions to calculate steady-state and time dependent ion abundance, level population, and coefficients of radiative transfer of the plasma. The model, which is based atomic data calculated using the Hullac code is refined both theoretically and experimentally. Calculation of the spectral emissivity and opacity are carried out over a wide range of plasma density and temperature, and pumping conditions to obtain high conversion efficiency are discussed.

Paper Details

Date Published: 18 March 2009
PDF: 8 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 727130 (18 March 2009); doi: 10.1117/12.814026
Show Author Affiliations
Akira Sasaki, Japan Atomic Energy Agency (Japan)
Katsunobu Nishihara, Osaka Univ. (Japan)
Atsushi Sunahara, Osaka Univ. (Japan)
Hiroyuki Furukawa, Osaka Univ. (Japan)
Takeshi Nishikawa, Okayama Univ. (Japan)
Fumihiro Koike, Kitasato Univ. (Japan)

Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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