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Proceedings Paper

Meso-scale simulation of the polymer dynamics in the formation process of line-edge roughness
Author(s): Hiroshi Morita; Masao Doi
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Paper Abstract

We studied the formation process of the line edge using meso scale simulations based on the dissipative particle dynamics method. The simulation model of the lithographic process is developed in which the dynamics of a polymer chain can be observed. We perform three kinds of simulations; 1) whole area exposure simulation, 2) line pattern simulation, 3) the simulation including the line edge. From our results, a sharp and a homogeneous interface between soluble and insoluble polymers is best solution to LER problem, although its roughness is the size of the chain dimension. The roughened edge can be found in the case of a wide and a homogeneous interface. These results indicate that our simulations can be applicable to study the LER problem and the dynamics of polymer chain will be one of the important origins of LER.

Paper Details

Date Published: 1 April 2009
PDF: 8 pages
Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 727337 (1 April 2009); doi: 10.1117/12.814017
Show Author Affiliations
Hiroshi Morita, National Institute of Advanced Industrial Science and Technology (Japan)
Masao Doi, Univ. of Tokyo (Japan)

Published in SPIE Proceedings Vol. 7273:
Advances in Resist Materials and Processing Technology XXVI
Clifford L. Henderson, Editor(s)

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