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Proceedings Paper

Optimal character-size exploration for increasing throughput of MCC lithographic systems
Author(s): Makoto Sugihara
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Paper Abstract

We propose a character size optimization technique to enhance throughput of multi-column-cell (MCC) lithographic systems in which transistor patterns are projected with multiple column cells in parallel. Each and every column cell is capable of projecting patterns with character projection (CP) and variable shaped beam (VSB) methods. Seeking the optimal character size of characters contributes to minimizing the number of EB shots and reducing the fabrication cost for ICs. Experimental results show that the character size optimization technique reduced 70.6% of EB shots in the best case with an available electron beam size.

Paper Details

Date Published: 17 March 2009
PDF: 12 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72710L (17 March 2009); doi: 10.1117/12.813884
Show Author Affiliations
Makoto Sugihara, Toyohashi Univ. of Technology (Japan)

Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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