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Proceedings Paper

Application of pixel-based mask optimization technique for high transmission attenuated PSM
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Paper Abstract

Sub-resolution assist features (SRAF) insertion using mask synthesis process based on pixel-based mask optimization schemes has been studied in recent years for various lithographical schemes, including 6% attenuated PSM (AttPSM) with off-axis illumination. This paper presents results of application of the pixelbased optimization technology to 6% and 30% AttPSM mask synthesis. We examine imaging properties of mask error enhancement factor (MEEF), critical dimension (CD) uniformity, and side-lobe printing for random contact hole patterns. We also discuss practical techniques for manipulating raw complex shapes generated by the pixel-based optimization engine that ensure mask manufacturability.

Paper Details

Date Published: 12 March 2009
PDF: 11 pages
Proc. SPIE 7275, Design for Manufacturability through Design-Process Integration III, 72750X (12 March 2009); doi: 10.1117/12.813753
Show Author Affiliations
Kyohei Sakajiri, Mentor Graphics Corp. (United States)
Alexander Trichkov, Mentor Graphics Corp. (United States)
Yuri Granik, Mentor Graphics Corp. (United States)
Eric Hendrickx, IMEC vzw (Belgium)
Geert Vandenberghe, IMEC vzw (Belgium)
Monica Kempsell, Mentor Graphics Corp. (United States)
Germain Fenger, Mentor Graphics Corp. (United States)
Klaus Boehm, Carl Zeis SMS (Germany)
Thomas Scheruebl, Carl Zeis SMS (Germany)

Published in SPIE Proceedings Vol. 7275:
Design for Manufacturability through Design-Process Integration III
Vivek K. Singh; Michael L. Rieger, Editor(s)

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