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Proceedings Paper

Innovative pattern matching method considering process margin and scanner design information
Author(s): Koichiro Tsujita; Koji Mikami; Hiroyuki Ishii; Ryo Nakayama; Mikio Arakawa; Takehiro Ueno; Shogo Fujie; Kazuhiro Takahashi
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Paper Abstract

Methods to improve accuracy of pattern matching are investigated with our software tool (k1 TUNE). Since pattern matching handles experimental data, resist simulation accuracy, SEM measurement accuracy, and identification of illumination situations used in the software and set in actual scanners are crucial. The methods to reduce their error are proposed. In addition to reducing them, a subtracting method is used to compensate them for better pattern matching. The effectiveness is certificated experimentally with accuracy of 0.010 sigma of illumination and 1~2nm of CD. Furthermore an illumination that keeps CDs constant under defocus is optimized, and the characteristics are confirmed experimentally. By using the software tool under the proposed ways, real pattern matching at fabrication lines has been possible with good accuracy, few retry, and consideration of defocus characteristics.

Paper Details

Date Published: 16 March 2009
PDF: 10 pages
Proc. SPIE 7274, Optical Microlithography XXII, 72740Y (16 March 2009); doi: 10.1117/12.813489
Show Author Affiliations
Koichiro Tsujita, Canon, Inc. (Japan)
Koji Mikami, Canon, Inc. (Japan)
Hiroyuki Ishii, Canon, Inc. (Japan)
Ryo Nakayama, Canon, Inc. (Japan)
Mikio Arakawa, Canon, Inc. (Japan)
Takehiro Ueno, Canon, Inc. (Japan)
Shogo Fujie, Canon, Inc. (Japan)
Kazuhiro Takahashi, Canon, Inc. (Japan)

Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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