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Proceedings Paper

Design and fabrication of mode size adapter using hybrid imprint lithography
Author(s): Se-Hwan Sim; Han-Hyong Kim; Seung-Kook Yang; Hai-Joong Park; Seong-Jong Kim; Beom-Hoan O; Seung-Gol Lee; El-Hang Lee; Se-Geun Park
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Paper Abstract

Mode size adapters that are needed to interconnect two planar waveguides of different sizes have been designed and fabricated by the imprinting lithography. Optimum dimensions of the adapters were determined by simulation. The input port of the mode size adapters has fixed cross section size of 10 μm wide and 7 μm height. From the simulation results, the output port should have the lowest optical loss at 5μm in height and 8μm in width. Molds for the imprint were prepared by noble hybrid imprint lithography which employed both imprinting and photolithography and fabrication of mode size adapters with smooth and sloped taper region was successfully demonstrated.

Paper Details

Date Published: 10 February 2009
PDF: 12 pages
Proc. SPIE 7219, Optoelectronic Integrated Circuits XI, 72190X (10 February 2009); doi: 10.1117/12.811958
Show Author Affiliations
Se-Hwan Sim, Inha Univ. (Korea, Republic of)
Han-Hyong Kim, Inha Univ. (Korea, Republic of)
Seung-Kook Yang, Inha Univ. (Korea, Republic of)
Hai-Joong Park, Inha Univ. (Korea, Republic of)
Seong-Jong Kim, Inha Univ. (Korea, Republic of)
Beom-Hoan O, Inha Univ. (Korea, Republic of)
Seung-Gol Lee, Inha Univ. (Korea, Republic of)
El-Hang Lee, Inha Univ. (Korea, Republic of)
Se-Geun Park, Inha Univ. (Korea, Republic of)

Published in SPIE Proceedings Vol. 7219:
Optoelectronic Integrated Circuits XI
Louay A. Eldada; El-Hang Lee, Editor(s)

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