Share Email Print
cover

Proceedings Paper

Comparison of ns and ps pulses for Si and glass micromachining applications
Author(s): Stephen Lee; Allan Ashmead; Leonard Migliore
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Demand for higher precision, clean laser based processes has driven the development of picosecond pulse width lasers that operate at high frequency with high average powers. Industries like microelectronics and LCD manufacturing are gearing up for the next generation of devices that demand tighter densities, better electrical efficiency, higher speed and better quality. We focus here on the differences between processing with nanosecond and picosecond pulses on Silicon and on alumino-borosilicate glass.

Paper Details

Date Published: 5 March 2009
PDF: 10 pages
Proc. SPIE 7193, Solid State Lasers XVIII: Technology and Devices, 719322 (5 March 2009);
Show Author Affiliations
Stephen Lee, Coherent, Inc. (United States)
Allan Ashmead, Coherent, Inc. (United States)
Leonard Migliore, Coherent, Inc. (United States)


Published in SPIE Proceedings Vol. 7193:
Solid State Lasers XVIII: Technology and Devices
W. Andrew Clarkson; Norman Hodgson; Ramesh K. Shori, Editor(s)

© SPIE. Terms of Use
Back to Top
PREMIUM CONTENT
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?
close_icon_gray