Proceedings Paper
Comparison of ns and ps pulses for Si and glass micromachining applications| Format | Member Price | Non-Member Price |
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Paper Abstract
Demand for higher precision, clean laser based processes has driven the development of picosecond pulse width lasers
that operate at high frequency with high average powers. Industries like microelectronics and LCD manufacturing are
gearing up for the next generation of devices that demand tighter densities, better electrical efficiency, higher speed and
better quality. We focus here on the differences between processing with nanosecond and picosecond pulses on Silicon
and on alumino-borosilicate glass.
Paper Details
Date Published: 5 March 2009
PDF: 10 pages
Proc. SPIE 7193, Solid State Lasers XVIII: Technology and Devices, 719322 (5 March 2009); doi: 10.1117/12.811064
Published in SPIE Proceedings Vol. 7193:
Solid State Lasers XVIII: Technology and Devices
W. Andrew Clarkson; Norman Hodgson; Ramesh K. Shori, Editor(s)
PDF: 10 pages
Proc. SPIE 7193, Solid State Lasers XVIII: Technology and Devices, 719322 (5 March 2009); doi: 10.1117/12.811064
Show Author Affiliations
Stephen Lee, Coherent, Inc. (United States)
Allan Ashmead, Coherent, Inc. (United States)
Allan Ashmead, Coherent, Inc. (United States)
Leonard Migliore, Coherent, Inc. (United States)
Published in SPIE Proceedings Vol. 7193:
Solid State Lasers XVIII: Technology and Devices
W. Andrew Clarkson; Norman Hodgson; Ramesh K. Shori, Editor(s)
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