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Proceedings Paper

Experimental study of nanometrological AFM based on 3-D F-P interferometers
Author(s): Yu Huang; Ruogu Zhu
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Paper Abstract

Nanometrological AFM with high-resolution interferometers can be used for a wide-ranged measurements and be traceable to the unit of length, but such problems as reduction of measuring uncertainty, correction of complex nonlinearity error and advancing of repeatability restrict the application of MAFM. This paper presents the design of metrological AFM based on double F-P interferometer in XYZ directions, which consists of one He-Ne laser, one '1 x 3' fiber splitter and four self-focused lens instead of three sets of He-Ne laser. This design can not only avoid the traceable error caused by different optical sources in three directions, but also improve the resolution of the measurement through the transfer of nano-dimension to a pair of fundamental frequency pulse interval, while external noise and disturbance caused by outside environment are dramatically eliminated using double F-P interferometers of the same cavity length and material. Nano-dimensional measurement and stability test have been successfully accomplished with double F-P system in X or Z direction with measurement sensitivity of &lgr;/2000nm , which meets the requirement of nanometrology.

Paper Details

Date Published: 12 January 2009
PDF: 10 pages
Proc. SPIE 7133, Fifth International Symposium on Instrumentation Science and Technology, 71334F (12 January 2009); doi: 10.1117/12.810963
Show Author Affiliations
Yu Huang, China Jiliang Univ. (China)
Ruogu Zhu, China Jiliang Univ. (China)

Published in SPIE Proceedings Vol. 7133:
Fifth International Symposium on Instrumentation Science and Technology
Jiubin Tan; Xianfang Wen, Editor(s)

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