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Proceedings Paper

Pulsed metalorganic chemical vapor deposition of high quality AlN/GaN superlattices for intersubband transitions
Author(s): C. Bayram; B. Fain; N. Péré-Laperne; Ryan P. McClintock; M. Razeghi
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Paper Abstract

A pulsed metalorganic chemical vapor deposition (MOCVD) technique, specifically designed for high quality AlN/GaN superlattices (SLs) is introduced. Optical quality and precise controllability over layer thicknesses are investigated. Indium is shown to improve interface and surface quality. An AlN/GaN SL designed for intersubband transition at a telecommunication wavelength of ~1.5 μm, is grown, and processed for intersubband (ISB) absorption measurements. Room temperature measurements show intersubband absorption centered at 1.49 μm. Minimal (n-type) silicon doping of the well is shown to be crucial for good ISB absorption characteristics. The potential to extend this technology into the far infrared and even the terahertz (THz) region is also discussed.

Paper Details

Date Published: 26 January 2009
PDF: 9 pages
Proc. SPIE 7222, Quantum Sensing and Nanophotonic Devices VI, 722212 (26 January 2009); doi: 10.1117/12.809829
Show Author Affiliations
C. Bayram, Northwestern Univ. (United States)
B. Fain, Northwestern Univ. (United States)
N. Péré-Laperne, Northwestern Univ. (United States)
Ryan P. McClintock, Northwestern Univ. (United States)
M. Razeghi, Northwestern Univ. (United States)

Published in SPIE Proceedings Vol. 7222:
Quantum Sensing and Nanophotonic Devices VI
Manijeh Razeghi; Rengarajan Sudharsanan; Gail J. Brown, Editor(s)

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