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Proceedings Paper

An evaporative co-assembly method for highly ordered inverse opal films
Author(s): Benjamin Hatton; Lidiya Mishchenko; Robert Norwood; Stan Davis; Kenneth Sandhage; Joanna Aizenberg
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Paper Abstract

Colloidal self-assembly holds promise for photonic applications as a solution-based, low-cost alternative to top-down photolithography, if significant control of uniformity and defects can be achieved. Herein we demonstrate a new evaporative co-assembly method for highly-uniform inverse opal thin films that involves the self-assembly of polymer colloids in a solution containing a silicate precursor. Nanoporous inverse opal films can be made crack-free and with highly uniform orientation at the cm scale. The silicate between the colloids appears to increase the strength against cracking. This control of defects makes this method well-suited for the low cost fabrication of such films as sensors and photonic devices.

Paper Details

Date Published: 23 February 2009
PDF: 5 pages
Proc. SPIE 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II, 72050F (23 February 2009); doi: 10.1117/12.809656
Show Author Affiliations
Benjamin Hatton, Harvard Univ. (United States)
Lidiya Mishchenko, Harvard Univ. (United States)
Robert Norwood, College of Optical Sciences, The Univ. of Arizona (United States)
Stan Davis, Georgia Institute of Technology (United States)
Kenneth Sandhage, Georgia Institute of Technology (United States)
Joanna Aizenberg, Harvard Univ. (United States)

Published in SPIE Proceedings Vol. 7205:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II
Thomas J. Suleski; Winston V. Schoenfeld; Jian Jim Wang, Editor(s)

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