
Proceedings Paper
1 &mgr;m wavelength adaptive optics scanning laser ophthalmoscopeFormat | Member Price | Non-Member Price |
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Paper Abstract
An adaptive optics scanning laser ophthalmoscope (AOSLO) corrects ocular aberrations to provide clear retinal images in
vivo with high lateral resolution. In this study, we developed an AOSLO system with a 1 μm wavelength probe beam. This
wavelength band is effective in improving the retinal imaging capability of AO systems. Because of the long wavelength,
the AOSLO system has high tolerance to a mechanical deformation of mirror surfaces; further, it is easier to achieve
diffraction limit of the system. To visualize individual photoreceptors, parafoveal regions of retinas of two normal subjects
were examined using the 1 μm wavelength AOSLO system. Ocular aberrations were measured using a Shack-Hartmann
wavefront sensor and an 840 nm superluminescent diode light source as an AO beacon. A magnetic deformable mirror was
used for the correction of ocular aberrations. When AO correction was carried out, the residual RMS wavefront error was
measured to be less than 0.1 μm. This residual aberration resulted in a lateral resolution of 3.6 μm of the retinal image.
Despite the relatively low transform-limited resolution due to the longer wavelength, the AOSLO could successfully be
used to visualize individual photoreceptors, flow of blood cells, and nerve fibers. It was found that the developed AOSLO
system with a center wavelength of 1 μm can effectively visualize individual photoreceptors.
Paper Details
Date Published: 18 February 2009
PDF: 7 pages
Proc. SPIE 7163, Ophthalmic Technologies XIX, 71630I (18 February 2009); doi: 10.1117/12.808753
Published in SPIE Proceedings Vol. 7163:
Ophthalmic Technologies XIX
Fabrice Manns; Per G. Söderberg; Arthur Ho, Editor(s)
PDF: 7 pages
Proc. SPIE 7163, Ophthalmic Technologies XIX, 71630I (18 February 2009); doi: 10.1117/12.808753
Show Author Affiliations
Yoshiaki Yasuno, Univ. of Tsukuba (Japan)
Published in SPIE Proceedings Vol. 7163:
Ophthalmic Technologies XIX
Fabrice Manns; Per G. Söderberg; Arthur Ho, Editor(s)
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