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Proceedings Paper

Measurement of photoelectrons decay in doping AgCl by microwave absorption phase-sensitive technique
Author(s): Xiuhong Dai; Guoyi Dong; Haiyan Liu; Xiaowei Li; Shaopeng Yang; Li Han
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Paper Abstract

The generation and decay of photoelectrons is an important factor in improving photographic efficiency of silver halide crystals. Microwave absorption phase-sensitive detection technology designed by our experiment group, was used to non-contact measure the transmission characteristic of photoelectronic in [Fe(CN)6]4- uniformly-doped AgCl microcrystals. The signal of free and shallow-trapped photoelectrons were measured in-phase. It is found that the photoelectrons decay time in cubic AgCl microcrystals doped with [Fe(CN)6]4- is longer than that of undoped samples at the first exposure time. And the photoelectrons decay time becomes longer with the doping concentration increasing. As is shown the doping centres can act as shallow electron traps. The results also show the photoelectrons decay time decreases significantly till becoming a constant after a few minutes exposure, and the constant is lower when the doping concentration is higher. By analysis the photoproduct is silver clusters with the characteristic of deep electron traps in the microcrystals. The measurement of photoelectrons by microwave absorption phase-sensitive detection technology can give evidence for the improving performance of the photosensitive material, optical information storage material and so on.

Paper Details

Date Published: 2 February 2009
PDF: 8 pages
Proc. SPIE 7160, 2008 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Applications, 71601P (2 February 2009); doi: 10.1117/12.806504
Show Author Affiliations
Xiuhong Dai, Hebei Univ. (China)
Guoyi Dong, Hebei Univ. (China)
Haiyan Liu, Hebei Univ. (China)
Xiaowei Li, Hebei Univ. (China)
Shaopeng Yang, Hebei Univ. (China)
Li Han, Hebei Univ. (China)

Published in SPIE Proceedings Vol. 7160:
2008 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Applications
Shenghua Ye; Guangjun Zhang; Jun Ni, Editor(s)

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