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Proceedings Paper

Orientation Zernike Polynomials: a systematic description of polarized imaging using high NA lithography lenses
Author(s): Tilmann Heil; Johannes Ruoff; Jens Timo Neumann; Michael Totzeck; Daniel Krähmer; Bernd Geh; Paul Gräupner
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Paper Abstract

We introduce the 'Orientation Zernike Polynomials', a base function representation of retardation and diattenuation which are most relevant for vector imaging. We show that the 'Orientation Zernike Polynomials' provide a complete and systematic description of vector imaging using high NA lithography lenses and, hence, a basis for an in depth understanding of both polarized and unpolarized imaging, and its modeling.

Paper Details

Date Published: 4 December 2008
PDF: 12 pages
Proc. SPIE 7140, Lithography Asia 2008, 714018 (4 December 2008); doi: 10.1117/12.805438
Show Author Affiliations
Tilmann Heil, Carl Zeiss SMT AG (Germany)
Johannes Ruoff, Carl Zeiss SMT AG (Germany)
Jens Timo Neumann, Carl Zeiss SMT AG (Germany)
Michael Totzeck, Carl Zeiss SMT AG (Germany)
Daniel Krähmer, Carl Zeiss SMT AG (Germany)
Bernd Geh, Carl Zeiss SMT AG (Germany)
ASML US, Inc. (United States)
Paul Gräupner, Carl Zeiss SMT AG (Germany)

Published in SPIE Proceedings Vol. 7140:
Lithography Asia 2008
Alek C. Chen; Burn Lin; Anthony Yen, Editor(s)

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