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Proceedings Paper

Optimization of laser-damage resistance of evaporated hafnia films at 351nm
Author(s): J. B. Oliver; S. Papernov; A. W. Schmid; J. C. Lambropoulos
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Paper Abstract

A systematic study was undertaken to improve the laser-damage resistance of multilayer high-reflector coatings for use at 351 nm on the OMEGA EP Laser System. A series of hafnium dioxide monolayer films deposited by electron-beam evaporation with varying deposition rates and oxygen backfill pressures were studied using transmission electron microscopy (TEM), x-ray diffraction (XRD), and refractive index modeling. These exhibit microstructural changes for sufficiently slow deposition rates and high oxygen backfill pressures, resulting in an absence of crystalline inclusions and a lower refractive index. Hafnia monolayers exhibited laser-damage resistance as high as 12 J/cm2 at 351 nm with a 0.5-ns pulse. This process was utilized in the fabrication of reduced electric-field-type multilayer high-reflector coatings. Measured laser-damage thresholds as high as 16.63 J/cm2 were achieved under identical test conditions, an exceptional improvement relative to historical damage thresholds of the order of 3 to 5 J/cm2.

Paper Details

Date Published: 30 December 2008
PDF: 11 pages
Proc. SPIE 7132, Laser-Induced Damage in Optical Materials: 2008, 71320J (30 December 2008); doi: 10.1117/12.805383
Show Author Affiliations
J. B. Oliver, Univ. of Rochester (United States)
S. Papernov, Univ. of Rochester (United States)
A. W. Schmid, Univ. of Rochester (United States)
J. C. Lambropoulos, Univ. of Rochester (United States)

Published in SPIE Proceedings Vol. 7132:
Laser-Induced Damage in Optical Materials: 2008
Gregory J. Exarhos; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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