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Proceedings Paper

A technique for rapid elimination of microbubbles for photochemical filter startup
Author(s): Aiwen Wu; Wailup Chow
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Paper Abstract

In semiconductor manufacturing processes, bubbles (often referred as microbubbles) can be contaminants that reduce manufacturing yield. In photolithography processes, a Point-of-Use filter is used on a clean track system to ensure lower wafer defect level by providing particle and bubble free photochemicals. However, filter changeout often results in significant chemical consumption and tool downtime due to purging of air from the system. This paper describes a technique developed to rapidly eliminate microbubbles during filter startup in a two stage dispense system. The experimental results suggest that by providing a constant pressure to the fluid after wetting the filter, we were able to effectively eliminate microbubbles in the fluid. Therefore, the filter startup process was significantly improved.

Paper Details

Date Published: 4 December 2008
PDF: 9 pages
Proc. SPIE 7140, Lithography Asia 2008, 71402Y (4 December 2008); doi: 10.1117/12.804691
Show Author Affiliations
Aiwen Wu, Entegris, Inc. (United States)
Wailup Chow, Entegris, Inc. (United States)

Published in SPIE Proceedings Vol. 7140:
Lithography Asia 2008
Alek C. Chen; Burn Lin; Anthony Yen, Editor(s)

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