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Proceedings Paper

Development of photosensitive silsesquioxane
Author(s): Yuji Tashiro; Takeshi Sekito; Takafumi Iwata; Daishi Yokoyama; Toshiaki Nonaka
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Paper Abstract

We succeeded in development of SOG materials comprised of cage-type phenyl silsesquioxanes (PSQ) and their alkali soluble derivatives. The alkali soluble silsesquioxane (APSQ) can provide both positive and negative tone photosensitive SOG combination with diazo naphtoquinone (DNQ) and photo-base (acid) agent, respectively. Here we present feature of photolithography process and film properties for our SOG materials.

Paper Details

Date Published: 4 December 2008
PDF: 11 pages
Proc. SPIE 7140, Lithography Asia 2008, 71402O (4 December 2008); doi: 10.1117/12.804669
Show Author Affiliations
Yuji Tashiro, AZ Electronic Materials Japan (Japan)
Takeshi Sekito, AZ Electronic Materials Japan (Japan)
Takafumi Iwata, AZ Electronic Materials Japan (Japan)
Daishi Yokoyama, AZ Electronic Materials Japan (Japan)
Toshiaki Nonaka, AZ Electronic Materials Japan (Japan)

Published in SPIE Proceedings Vol. 7140:
Lithography Asia 2008
Alek C. Chen; Burn Lin; Anthony Yen, Editor(s)

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