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Proceedings Paper

CD control enhancement by laser bandwidth stabilization for advanced lithography application
Author(s): R. C. Peng; Tony Wu; K. W. Chang; C. P. Yeh; H. H. Liu; H. J. Lee; John Lin; Allen Chang; Benjamin Szu-Min Lin
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Paper Abstract

Control of circuit CD in a photolithographic process has become increasingly important, particularly for those advanced nodes below 45nm because it influences device performances greatly. The variation of circuit CD depends on many factors, for example, CD uniformity on reticles, focus, lens aberrations, partial coherence, photoresist performance and LASER spectral bandwidth. In this paper, we focus on LASER spectral bandwidth effects to reduce circuit CD variation. High-volume products of a leading technology node are examined and a novel LASER control function: Gas Lifetime eXtenstion (GLX) is implemented to obtain stable LASER bandwidth. The LASER bandwidth variation was stabilized by changing laser F2 gas concentration through advanced control algorithm and signal process techniques. Product photo-pattern CD variation and device electrical performances will be examined to confirm the benefits of the LASER bandwidth stabilization.

Paper Details

Date Published: 4 December 2008
PDF: 9 pages
Proc. SPIE 7140, Lithography Asia 2008, 714041 (4 December 2008); doi: 10.1117/12.804616
Show Author Affiliations
R. C. Peng, Taiwan Semiconductor Manufacturing Corp. (Taiwan)
Tony Wu, Taiwan Semiconductor Manufacturing Corp. (Taiwan)
K. W. Chang, Taiwan Semiconductor Manufacturing Corp. (Taiwan)
C. P. Yeh, Taiwan Semiconductor Manufacturing Corp. (Taiwan)
H. H. Liu, Taiwan Semiconductor Manufacturing Corp. (Taiwan)
H. J. Lee, Taiwan Semiconductor Manufacturing Corp. (Taiwan)
John Lin, Taiwan Semiconductor Manufacturing Corp. (Taiwan)
Allen Chang, Cymer Inc. (Taiwan)
Benjamin Szu-Min Lin, Cymer Inc. (Taiwan)

Published in SPIE Proceedings Vol. 7140:
Lithography Asia 2008
Alek C. Chen; Burn Lin; Anthony Yen, Editor(s)

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