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Proceedings Paper

Development status of back-end process for UV-NIL template fabrication
Author(s): Yuichi Inazuki; Kimio Itoh; Sho Hatakeyama; Kouichirou Kojima; Masaaki Kurihara; Yasutaka Morikawa; Hiroshi Mohri; Naoya Hayashi
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Paper Abstract

Nano-imprint lithography (NIL) is eminently suitable for low cost patterning for nanostructures. As feature sizes of the UV-NIL templates are the same as the wafer patterns, there are enormous challenges such as writing and inspecting smaller patterns for NIL template fabrication. In our previous works, we achieved less than 16nm resolution with a 100keV spot beam writer and non CAR. We also reported optimization of metrology for NIL templates and the characterization of anti-sticking layers with scanning probe microscopies. Normally the template is made from a 6025 photomask blank. After the blank undergoes a process similar to the photomask process, it is diced into 65 mm x 65 mm size and four pieces, and then each piece is polished into its final shape. Therefore it becomes difficult to inspect and clean them, because 65 mm substrates are unfamiliar in photomask industry. In order to reach the step for mass-production of the templates, the development of "back-end process", which includes not only cleaning and inspection but also repair, dicing, polishing, and coating anti-sticking layers, is essential. Especially keeping low contamination level during dicing and polishing processes is one of the critical issues. In this paper, we report our development status of "back-end process" for NIL templates. Especially, we focus on the techniques of reducing adder defects during dicing process and improving cleaning capability.

Paper Details

Date Published: 17 October 2008
PDF: 8 pages
Proc. SPIE 7122, Photomask Technology 2008, 71223Q (17 October 2008); doi: 10.1117/12.803615
Show Author Affiliations
Yuichi Inazuki, Dai Nippon Printing Co., Ltd. (Japan)
Kimio Itoh, Dai Nippon Printing Co., Ltd. (Japan)
Sho Hatakeyama, Dai Nippon Printing Co., Ltd. (Japan)
Kouichirou Kojima, Dai Nippon Printing Co., Ltd. (Japan)
Masaaki Kurihara, Dai Nippon Printing Co., Ltd. (Japan)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Mohri, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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