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Proceedings Paper

Improving cost of ownership on KLA-Tencor wafer fab reticle inspections by implementing pixel migration via new STARlight2+ capability
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Paper Abstract

In the ever-changing semiconductor industry, wafer fabs and mask shops alike are adding low cost of ownership (CoO) to the list of requirements for inspections tools. KLA-Tencor has developed and introduced STARlight2+ (SL2+) to satisfy this need. This new software algorithm is available on all TeraScanHR and TeraFab models. KLA-Tencor has cooperated with United Microelectronics Corporation (UMC) to demonstrate and improve SL2+, including its ability to lower CoO, on 65nm and below photomasks. These improvements are built on the rich history of STARlight. Over the years, STARlight has become one of the industry standards for reticle inspection. Like its predecessors, SL2+ uses only transmitted and reflected light images from a reticle to identify defects on the reticle. These images along with plate-specific information are then processed by SL2+ to generate reference images of how the patterns on the reticle should appear. These reference images are then compared with the initial optical images to identify the defects. The new and improved SL2+ generates more accurate reference images. These images reduce background noise and increase the usable sensitivity. With the results from controlled engineering tests, a fab or mask shop can then decide to inspect reticles at a given technology node with a large pixel; this is sometimes referred to as pixel migration. The larger pixel with SL2+ can then perform the inspections at similar sensitivity settings and higher throughput, thus lowering CoO.

Paper Details

Date Published: 17 October 2008
PDF: 9 pages
Proc. SPIE 7122, Photomask Technology 2008, 71223J (17 October 2008); doi: 10.1117/12.802331
Show Author Affiliations
Yung-Feng Cheng, United Microelectronics Corp. (Taiwan)
Wei-Cyuan Lo, United Microelectronics Corp. (Taiwan)
Ming-Jui Chen, United Microelectronics Corp. (Taiwan)
Peter Huang, United Microelectronics Corp. (Taiwan)
Chunlin Chen, KLA-Tencor Corp. (United States)
Swapnajit Chakravarty, KLA-Tencor Corp. (United States)
Paul Yu, KLA-Tencor Corp. (United States)
Russell Dover, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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