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Proceedings Paper

Sub-wavelength resolution laser lithography in the field of MEMS
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Paper Abstract

In this paper I present some techniques by which MEMS structures with sub-wavelength resolution can be obtained when using laser lithography. I concentrate on two major techniques: single photon and multi-photon absorption processes.

Paper Details

Date Published: 29 April 2008
PDF: 11 pages
Proc. SPIE 7007, INDLAS 2007: Industrial Laser Applications, 70070L (29 April 2008); doi: 10.1117/12.801971
Show Author Affiliations
Gabriel Moagar-Poladian, IMT-Bucharest (Romania)

Published in SPIE Proceedings Vol. 7007:
INDLAS 2007: Industrial Laser Applications
Mircea Udrea, Editor(s)

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