
Proceedings Paper
Improvements in accuracy of dense OPC modelsFormat | Member Price | Non-Member Price |
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Paper Abstract
Performing model-based optical proximity correction (MBOPC) on layouts has become an integral part of
patterning advanced integrated circuits. Earlier technologies used sparse OPC, the run times of which explode when the
density of layouts increases. With the move to 45 nm technology node, this increase in run time has resulted in a shift to
dense simulation OPC, which is pixel-based. The dense approach becomes more efficient at 45nm technology node and
beyond. New OPC model forms can be used with the dense simulation OPC engine, providing the greater accuracy
required by smaller technology nodes. Parameters in the optical model have to be optimized to achieve the required
accuracy. Dense OPC uses a resist model with a different set of parameters than sparse OPC. The default search ranges
used in the optimization of these resist parameters do not always result in the best accuracy. However, it is possible to
improve the accuracy of the resist models by understanding the restrictions placed on the search ranges of the physical
parameters during optimization. This paper will present results showing the correlation between accuracy of the models
and some of these optical and resist parameters. The results will show that better optimization can improve the model
fitness of features in both the calibration and verification set.
Paper Details
Date Published: 17 October 2008
PDF: 12 pages
Proc. SPIE 7122, Photomask Technology 2008, 71221Q (17 October 2008); doi: 10.1117/12.801695
Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)
PDF: 12 pages
Proc. SPIE 7122, Photomask Technology 2008, 71221Q (17 October 2008); doi: 10.1117/12.801695
Show Author Affiliations
Chidam Kallingal, Advanced Micro Devices, Inc. (United States)
James Oberschmidt, IBM (United States)
Ramya Viswanathan, IBM (United States)
James Oberschmidt, IBM (United States)
Ramya Viswanathan, IBM (United States)
Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)
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