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Proceedings Paper

Damage mechanisms and process optimization for photomasks with sub-resolution assist features
Author(s): L. Kindt; E. Gallagher; J. Levin; Y. Kodera; Y. Okawa; Y. Sasaki
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Paper Abstract

Sub-Resolution Assist Features (SRAFs) are typically the smallest features on a photomask and amplify many of the challenges in mask manufacturing. During the initial stages of process development, resist feature adhesion is the dominate damage mechanism. Throughout mask fabrication, the influence of inherent material properties and wet processing can eventually delaminate SRAFs. The various mechanisms that cause SRAF damage will be presented systematically. Process optimization steps to address the failure mechanisms will be presented. Data illustrating the improved process window for small features will be included.

Paper Details

Date Published: 17 October 2008
PDF: 11 pages
Proc. SPIE 7122, Photomask Technology 2008, 71220I (17 October 2008); doi: 10.1117/12.801568
Show Author Affiliations
L. Kindt, IBM (United States)
E. Gallagher, IBM (United States)
J. Levin, IBM (United States)
Y. Kodera, Toppan Photomasks, Inc. (United States)
Y. Okawa, Toppan Printing Co., Ltd. (Japan)
Y. Sasaki, Toppan Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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