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Proceedings Paper

Model-based assist feature placement: an inverse imaging approach
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Paper Abstract

The continuing reduction in feature dimensions and tightening of process constraints have led to an increasing demand for model-based approaches, which can efficiently explore the AF solution space, and achieve AF configurations not easily accessible via rules. In this work, we approach the AF placement problem as an inverse imaging problem. We discuss the generation of an inverse mask field and its use in determining the assist feature location. The results are compared with the single iteration intensity-field based AF placement with regard to symmetry, speed, memory, convergence, and accuracy. Several results with different pitches and illumination conditions are presented to demonstrate the robustness and adaptability of the inverse mask AF placement.

Paper Details

Date Published: 17 October 2008
PDF: 10 pages
Proc. SPIE 7122, Photomask Technology 2008, 71220U (17 October 2008); doi: 10.1117/12.801539
Show Author Affiliations
Amyn Poonawala, Synopsys, Inc. (United States)
Benjamin Painter, Synopsys, Inc. (United States)
Jeffrey Mayhew, Synopsys, Inc. (United States)

Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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