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Proceedings Paper

Benchmarking EUV mask inspection beyond 0.25 NA
Author(s): Kenneth A. Goldberg; Iacopo Mochi; Patrick P. Naulleau; Hakseung Han; Sungmin Huh
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Paper Abstract

The SEMATECH Berkeley Actinic Inspection Tool (AIT) is an EUV zoneplate microscope dedicated to photomask research. Recent upgrades have given the AIT imaging system selectable numerical aperture values of 0.25, 0.30, and 0.35 (4 equivalent). The highest of which provides resolution beyond the current generation of EUV lithography research tools, giving above 75% contrast for dense-line features with 100-nm half-pitch on the mask, and above 70% for 88-nm half-pitch. To improve the imaging system alignment, we used through-focus images of small contacts to extract aberration magnitudes and compare with modeling. The astigmatism magnitude reached a low value of 0.08 waves RMS. We present the results of performance benchmarking and repeatability tests including contrast, and line width measurements.

Paper Details

Date Published: 17 October 2008
PDF: 8 pages
Proc. SPIE 7122, Photomask Technology 2008, 71222E (17 October 2008); doi: 10.1117/12.801529
Show Author Affiliations
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
Iacopo Mochi, Lawrence Berkeley National Lab. (United States)
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
Hakseung Han, Samsung Electronics (Korea, Republic of)
Sungmin Huh, SEMATECH (United States)

Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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