
Proceedings Paper
Enhancing OPC model stability and predictability using SEM image contoursFormat | Member Price | Non-Member Price |
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Paper Abstract
The process model is a major factor affecting the quality of the Model Based Optical Proximity Correction
(OPC). Better process model directly leads to better OPC, hence better yield and more profit. While the
traditional way in calibrating these process models is using CD measurements at sample locations in the test chip,
however, the use of Scanning Electron Microscope (SEM) image contours for process model calibration and
optimization has been recently introduced in trial to build more predictable models. In this study, we characterize
the traditional flow models versus the contour calibrated models and study the effect of using different
combinations and weighting schemes on the quality of the resulting process models, its stability and its ability to
correctly predict the process.
Paper Details
Date Published: 17 October 2008
PDF: 9 pages
Proc. SPIE 7122, Photomask Technology 2008, 712244 (17 October 2008); doi: 10.1117/12.801513
Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)
PDF: 9 pages
Proc. SPIE 7122, Photomask Technology 2008, 712244 (17 October 2008); doi: 10.1117/12.801513
Show Author Affiliations
Mohamed Serag El-Din Habib, Mentor Graphics Corp. (United States)
Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)
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