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Proceedings Paper

Novel CD measurement and precise pattern size extraction method for optical images
Author(s): Lev Faivishevsky
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Paper Abstract

A new method for accurate CD measurement and precise pattern size extraction from optical images is proposed. The approach is based on the underlying field theory of optical image generation. The method demonstrates superior precision compared with traditional edge detection schemes based on the image and not on the field nature of image creation. The proposed method presents accuracy parallel to that achieved by SEM imaging. Therefore it provides an alternative to electronic microscopy measurements in certain cases. This new method may be implemented for applications of accurate mask-CD measurement, as well as for retrieving the mask model from an optical image for a die to model application.

Paper Details

Date Published: 17 October 2008
PDF: 8 pages
Proc. SPIE 7122, Photomask Technology 2008, 71223C (17 October 2008); doi: 10.1117/12.801434
Show Author Affiliations
Lev Faivishevsky, Applied Materials (Israel)

Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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