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Proceedings Paper

Road to a zero degree total temperature range post exposure bake process
Author(s): Tobias Wähler; Peter Dress
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Paper Abstract

With tighter CD uniformity requirements, a tighter temperature control during a Post Exposure Bake (PEB) process for photomask production becomes more and more important. CD non uniformities can be partially ascribed to deficiencies of the measurement devices used for the process qualification of a PEB hotplate system. In this paper, a new routine is proposed to overcome the deficiencies of the measurement devices used, so that further improvement of the hotplate performance becomes possible. Using a 25 point sensor array, we finally achieved a bake performance of the hotplate system described in terms of "real" total temperature range on the mask surface, of 0.4°C during temperature ramp-up and below 0.1°C at steady state for a final mean temperature of 100°C. This is a first step in the right direction towards a temperature range of zero for the bake process.

Paper Details

Date Published: 17 October 2008
PDF: 10 pages
Proc. SPIE 7122, Photomask Technology 2008, 71220C (17 October 2008); doi: 10.1117/12.801369
Show Author Affiliations
Tobias Wähler, HamaTech APE GmbH & Co. KG (Germany)
Peter Dress, HamaTech APE GmbH & Co. KG (Germany)

Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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