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Proceedings Paper

Fast and accurate hybrid subgrid and subcell finite-difference time-domain methods for the simulation of mask electromagnetic effects in sub-45nm lithography
Author(s): Michael S. Yeung
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Paper Abstract

Subgrid and subcell FDTD (S-FDTD) methods are described. They can be used for the fast and accurate simulation of mask electromagnetic effects in sub-45nm lithography. The accuracies of the S-FDTD methods are verified by comparison with FDTD and with a very accurate pseudospectral reference solution. The S-FDTD methods are an order of magnitude or more faster than FDTD. Furthermore, the S-FDTD methods require much less memory than FDTD for time marching. Hence, much larger mask areas can be simulated with S-FDTD than with FDTD.

Paper Details

Date Published: 17 October 2008
PDF: 10 pages
Proc. SPIE 7122, Photomask Technology 2008, 71221T (17 October 2008); doi: 10.1117/12.801351
Show Author Affiliations
Michael S. Yeung, Fastlitho, Inc. (United States)

Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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