Proceedings Paper
A practical solution to the critical problem of 193 nm reticle haze| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
This paper summarizes the dramatic results achieved through the use of novel reticle haze prevention techniques and
new equipment which have enabled these results. Near continuous XCDA® purge of reticle pods coupled with
integrated pod purifiers resulted in the elimination of reticle haze defects for the usable production life of reticles.
Paper Details
Date Published: 19 May 2008
PDF: 7 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70282G (19 May 2008); doi: 10.1117/12.799669
Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)
PDF: 7 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70282G (19 May 2008); doi: 10.1117/12.799669
Show Author Affiliations
David L. Halbmaier, Entegris, Inc. (United States)
Yasushi Ohyashiki, Entegris, Inc. (United States)
Yasushi Ohyashiki, Entegris, Inc. (United States)
Oleg Kishkovich, Entegris, Inc. (United States)
Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)
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