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Proceedings Paper

Printing of sub-resolution shots in electron beam direct write with variable shaped beam machines
Author(s): Frank Thrum; Johannes Kretz; Christoph Hohle; Kang-Hoon Choi; Katja Keil
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Paper Abstract

The resolution of a variable shaped beam writer is typically given for the standard geometries like isolated line, isolated space, and dense (1:1) line/space pattern. It is related to the imaging power of both the tool itself as well as the resist process. In this paper we concentrate on small shots with dimensions smaller than the resolution limit, butting to a larger shot. We show experimentally that for a line resolution of 40 nm the resolution for butting sub resolution shots can be as small as 20 nm.

Paper Details

Date Published: 2 May 2008
PDF: 6 pages
Proc. SPIE 6792, 24th European Mask and Lithography Conference, 67920B (2 May 2008); doi: 10.1117/12.798585
Show Author Affiliations
Frank Thrum, Qimonda Dresden GmbH & Co. OHG (Germany)
Johannes Kretz, Qimonda Dresden GmbH & Co. OHG (Germany)
Christoph Hohle, Qimonda Dresden GmbH & Co. OHG (Germany)
Kang-Hoon Choi, Qimonda Dresden GmbH & Co. OHG (Germany)
Katja Keil, Fraunhofer Ctr. for Nanoelectronic Technologies (Germany)

Published in SPIE Proceedings Vol. 6792:
24th European Mask and Lithography Conference
Uwe F.W. Behringer, Editor(s)

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