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Proceedings Paper

Low-loss HR coatings on fused silica substrates for 193 nm micro-lithography applications
Author(s): Sven Laux; Helmut Bernitzki; Dieter Fasold; Michael Klaus; Uwe Schuhmann
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Paper Abstract

High reflective coatings for 193nm wavelength and 45° incidence were developed which combines the advantages of all-oxide and all-fluorides layer stacks. Using plasma-assisted evaporation very smooth and dense Al2O3/ SiO2 multilayers showing small light scatter were deposited onto fused silica substrates. In the same coating process followed metal fluoride stacks, which could reduce the resulting coating absorption at 193nm. The non-polarized reflectance of combined stacks at 193nm is R>98.5% at 45° and R>98.0% for an angle range of 42°-48°. As the number of fluoride layers could be drastically reduced compared to all-fluoride coatings any formation of micro-cracks could be avoided. The stress of the oxide/fluoride stacks was less than 40MPa.

Paper Details

Date Published: 25 September 2008
PDF: 5 pages
Proc. SPIE 7101, Advances in Optical Thin Films III, 71010Y (25 September 2008); doi: 10.1117/12.797820
Show Author Affiliations
Sven Laux, JENOPTIK Laser, Optik, Systeme GmbH (Germany)
Helmut Bernitzki, JENOPTIK Laser, Optik, Systeme GmbH (Germany)
Dieter Fasold, JENOPTIK Laser, Optik, Systeme GmbH (Germany)
Michael Klaus, JENOPTIK Laser, Optik, Systeme GmbH (Germany)
Uwe Schuhmann, JENOPTIK Laser, Optik, Systeme GmbH (Germany)

Published in SPIE Proceedings Vol. 7101:
Advances in Optical Thin Films III
Norbert Kaiser; Michel Lequime; H. Angus Macleod, Editor(s)

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