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Proceedings Paper

AZO films prepared by r.f. magnetron sputtering: structural, electrical, and optical properties
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Paper Abstract

Aluminium-doped zinc oxide films with 91% transmittance in the visible range and electrical resistivity of the order of 10-3 Ωcm were fabricated by radio frequency magnetron sputtering in Ar atmosphere starting from a target of ZnO mixed with 2% wt Al2O3. A systematic study of the deposition conditions such as substrate temperature, working gas pressure, radio frequency power, magnetron strength, target to substrate distance, etc., was performed when searching for improved electrical and optical performances of the films. Several deposition conditions govern the film characteristics, so that films with same good optical and electrical properties can be obtained by opportunely combining different deposition parameters.

Paper Details

Date Published: 25 September 2008
PDF: 8 pages
Proc. SPIE 7101, Advances in Optical Thin Films III, 71011Q (25 September 2008); doi: 10.1117/12.797665
Show Author Affiliations
Sylvia Boycheva, Technical Univ. of Sofia (Bulgaria)
Angela Piegari, ENEA (Italy)

Published in SPIE Proceedings Vol. 7101:
Advances in Optical Thin Films III
Norbert Kaiser; Michel Lequime; H. Angus Macleod, Editor(s)

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