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Proceedings Paper

Aberrations in curved x-ray multilayers
Author(s): Ch. Morawe; J.-P. Guigay; V. Mocella; C. Ferrero; H. Mimura; S. Handa; K. Yamauchi
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Paper Abstract

Aberration effects in curved multilayers for hard X rays are studied using a simple analytical approach. The method is based on geometrical ray tracing including refraction effects up to the first order of the refractive index decrement δ. The interpretation of the underlying equations provides fundamental insight into the focusing properties of these devices. Using realistic values for the multilayer parameters the impact on spot broadening and chromaticity is evaluated. The work is complemented by a comparison with experimental focusing results obtained with a W/B4C multilayer mirror.

Paper Details

Date Published: 3 September 2008
PDF: 12 pages
Proc. SPIE 7077, Advances in X-Ray/EUV Optics and Components III, 70770T (3 September 2008); doi: 10.1117/12.794534
Show Author Affiliations
Ch. Morawe, European Synchrotron Radiation Facility (France)
J.-P. Guigay, European Synchrotron Radiation Facility (France)
V. Mocella, European Synchrotron Radiation Facility (France)
Istituto per la Microelettronica e Microsistemi, CNR (Italy)
C. Ferrero, European Synchrotron Radiation Facility (France)
H. Mimura, Osaka Univ. (Japan)
S. Handa, Osaka Univ. (Japan)
K. Yamauchi, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 7077:
Advances in X-Ray/EUV Optics and Components III
Ali M. Khounsary; Christian Morawe; Shunji Goto, Editor(s)

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