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Proceedings Paper

Verification of mask manufacturing load estimation (MiLE)
Author(s): Yoshikazu Nagamura; Shogo Narukawa; Yoshiharu Shika; Hiroshi Kabashima; Aki Nakajo; Isao Miyazaki; Satoshi Aoyama; Yasutaka Morikawa; Hiroshi Mohri; Tomoko Hatada; Masahiro Kato; Hidemichi Kawase
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Paper Abstract

The design shrinking of semiconductor devices and the pattern complexity generated after OPC (optical proximity correction) have an impact on the two major cost consuming processes in mask manufacturing, EB (electron beam) writing and defect assurance. Mask-DFM (design for manufacturing) is a technique with various steps ranging from the design to the mask manufacturing to produce the mask friendly designs and to reduce the workload in the advanced mask production. We have previously reported on our system, called MiLE (Mask manufacturing Load Estimation), which quantifies the mask manufacturing workload by using the results of mask layout analyses. MiLE illustrates the benefits of mask-DFM efforts as numerical indexes and accelerates the DFM approaches. In this paper, we will show the accuracy of the workload estimation of the advanced devices by the comparison between the indexes and the process times in the actual mask manufacturing. The throughput of MiLE calculation of the production masks of a 65nm device was measured.

Paper Details

Date Published: 19 May 2008
PDF: 9 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 702837 (19 May 2008); doi: 10.1117/12.793114
Show Author Affiliations
Yoshikazu Nagamura, Renesas Technology Corp. (Japan)
Shogo Narukawa, Dai Nippon Printing Co., Ltd. (Japan)
Yoshiharu Shika, Renesas Technology Corp. (Japan)
Hiroshi Kabashima, Renesas Technology Corp. (Japan)
Aki Nakajo, Renesas Technology Corp. (Japan)
Isao Miyazaki, Renesas Technology Corp. (Japan)
Satoshi Aoyama, Renesas Technology Corp. (Japan)
Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Mohri, Dai Nippon Printing Co., Ltd. (Japan)
Tomoko Hatada, Keirex Technology Inc. (Japan)
Masahiro Kato, Keirex Technology Inc. (Japan)
Hidemichi Kawase, Keirex Technology Inc. (Japan)

Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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