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Proceedings Paper

Hotspot management in which mask fabrication errors are considered
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Paper Abstract

Hotspot management in low k1 lithography is essential for the achievement of high yield in the manufacture of devices. We have developed a mask quality assurance system with hotspot management based on lithography simulation with SEM image edge extraction of actual mask patterns. However, there are issues concerning this hotspot management from the viewpoint of hotspot sampling and turnaround time. To solve these problems, we modify the mask quality assurance system by introducing dynamic adaptive sampling in which hotspots are sampled depending on actual mask fabrication quality. As a result, producer's and consumer's risks are efficiently reduced, and TAT for mask inspection is also reduced.

Paper Details

Date Published: 19 May 2008
PDF: 8 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70282U (19 May 2008); doi: 10.1117/12.793100
Show Author Affiliations
Mitsuyo Kariya, Toshiba Semiconductor Co. (Japan)
Eiji Yamanaka, Toshiba Semiconductor Co. (Japan)
Kenji Yoshida, Toshiba Semiconductor Co. (Japan)
Kenji Konomi, Toshiba Semiconductor Co. (Japan)
Masaki Satake, Toshiba Semiconductor Co. (Japan)
Satoshi Tanaka, Toshiba Semiconductor Co. (Japan)

Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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