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Proceedings Paper

Implementation of new reticle inspection technology for progressive mask defect detection strategy in wafer fabs
Author(s): Cathy Liu; Alex Lu; Crystal Wang; Eric Guo; Dongsheng Fan; Lisa Yun; Steven Liu; Raj Badoni; Eric Lu
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Paper Abstract

Progressive and haze defects continue to be the primary cause of mask degradation and mask re-clean due mainly to intensified density of photon energy involved with ArF exposure. To monitor and prevent haze in production, the methodology of direct reticle inspection has been widely implemented in wafer fabs to provide early warning of haze defects before they reach a critical level. With the continuous shrinkage of IC design rules for scaling devices, reticle inspection systems are increasingly challenged by aggressive OPC and high sensitivity requirements to detect printable defects. In this paper, two new reticle inspection technologies: STARlight2+TM (SL2+) and Thin-line De-sense (TLD) on Die-to-Die (D2D) mode have been studied and evaluated on ArF production test reticles. The haze defect capture rate, defect residue modulation, and rendering on SL2+ mode have been compared with STARlight2 (SL2); the false defect count and usable sensitivity for D2D with TLD have been compared with D2D mode without TLD. The results of the two new technologies revealed significant improvement on sensitivity, inspectability.

Paper Details

Date Published: 19 May 2008
PDF: 7 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70282D (19 May 2008); doi: 10.1117/12.793087
Show Author Affiliations
Cathy Liu, Semiconductor Manufacturing International Corp. (China)
Alex Lu, Semiconductor Manufacturing International Corp. (China)
Crystal Wang, Semiconductor Manufacturing International Corp. (China)
Eric Guo, Semiconductor Manufacturing International Corp. (China)
Dongsheng Fan, KLA-Tencor Corp. (China)
Lisa Yun, KLA-Tencor Corp. (China)
Steven Liu, KLA-Tencor Corp. (United States)
Raj Badoni, KLA-Tencor Corp. (United States)
Eric Lu, KLA-Tencor Corp. (United States)

Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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