Proceedings Paper
Highly (h00) oriented growth of SrTiO3 thin films on Si(100) substrates by RF magnetron sputtering and their optical properties| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
SrTiO3 (STO) thin films were grown on Si(100) substrates by RF magnetron sputtering. The substrate temperature was
found to be a crucial parameter to obtain the highly (h00) oriented growth. At the substrate temperature of 700 °C, STO
thin films with the (h00)-orientation parameter (αh00) of more than 93% were realized. Using vitreous silica as the
substrate, the optical properties of STO thin film prepared at 700 °C were investigated by transmittance measurements.
The fitting method was used to calculate the refractive index and the film thickness from the transparent region of the
transmittance spectra. The dispersion of the refractive index was studied by considering a single electronic oscillator
model. According to Tauc's law, the band gap of the film was found to be about 3.62 eV.
Paper Details
Date Published: 11 March 2008
PDF: 4 pages
Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69841Z (11 March 2008); doi: 10.1117/12.792775
Published in SPIE Proceedings Vol. 6984:
Sixth International Conference on Thin Film Physics and Applications
Wenzhong Shen; Junhao Chu, Editor(s)
PDF: 4 pages
Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69841Z (11 March 2008); doi: 10.1117/12.792775
Show Author Affiliations
J. H. Ma, Shanghai Institute of Technical Physics (China)
J. H. Pin, Shanghai Institute of Technical Physics (China)
Z. M. Huang, Shanghai Institute of Technical Physics (China)
Y. H. Gao, Shanghai Institute of Technical Physics (China)
J. H. Pin, Shanghai Institute of Technical Physics (China)
Z. M. Huang, Shanghai Institute of Technical Physics (China)
Y. H. Gao, Shanghai Institute of Technical Physics (China)
T. Lin, Shanghai Institute of Technical Physics (China)
F. W. Shi, Shanghai Institute of Technical Physics (China)
J. L. Sun, Shanghai Institute of Technical Physics (China)
J. H. Chu, Shanghai Institute of Technical Physics (China)
F. W. Shi, Shanghai Institute of Technical Physics (China)
J. L. Sun, Shanghai Institute of Technical Physics (China)
J. H. Chu, Shanghai Institute of Technical Physics (China)
Published in SPIE Proceedings Vol. 6984:
Sixth International Conference on Thin Film Physics and Applications
Wenzhong Shen; Junhao Chu, Editor(s)
© SPIE. Terms of Use
