
Proceedings Paper
The structural and electrochemical properties of tin oxide films prepared by RF magnetron sputteringFormat | Member Price | Non-Member Price |
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Paper Abstract
Tin oxide thin films have been deposited on oxide silicon substrates using a RF magnetron sputtering process with
various sputtering power. The crystal structures of the tin oxide thin films were characterized and analyzed by X-ray
diffraction. The surface morphology of the films were observed by SEM. The electrochemical properties of the films
were also tested by constant current charge and discharge cycle tests. The results of XRD indicate that all the films are
crystalline. The results of SEM exhibit that the grain size of surface expands as sputtering power rises.
Paper Details
Date Published: 11 March 2008
PDF: 4 pages
Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69842H (11 March 2008); doi: 10.1117/12.792136
Published in SPIE Proceedings Vol. 6984:
Sixth International Conference on Thin Film Physics and Applications
Wenzhong Shen; Junhao Chu, Editor(s)
PDF: 4 pages
Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69842H (11 March 2008); doi: 10.1117/12.792136
Show Author Affiliations
Minzhen Cai, Xiamen Univ. (China)
Jie Song, Xiamen Univ. (China)
Liangtang Zhang, Xiamen Univ. (China)
Jie Song, Xiamen Univ. (China)
Liangtang Zhang, Xiamen Univ. (China)
Qihui Wu, Xiamen Univ. (China)
Suntao Wu, Xiamen Univ. (China)
Suntao Wu, Xiamen Univ. (China)
Published in SPIE Proceedings Vol. 6984:
Sixth International Conference on Thin Film Physics and Applications
Wenzhong Shen; Junhao Chu, Editor(s)
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