
Proceedings Paper
New design techniques and alignment methods for CGH-null testing of aspheric surfaceFormat | Member Price | Non-Member Price |
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Paper Abstract
The entire process of designing the test setup with a computer-generated hologram (CGH), fabricating the CGH with a
laser direct writing system and performing the CGH-null test of an asphere will be described in detail. New
considerations in designing the null corrector with calculating CGH's phase function, filtering off unwanted diffraction
orders and aligning CGH to the interferometer are discussed. A laser writing machine is used to fabricate designing
patterns onto plane substrate and substrate figure error, pattern distortion, etching and duty cycle variations that influence
the reconstructed wavefront are quantitatively analyzed in theory and corresponding error equations are obtained. The
CGH used for measuring a paraboloid mirror is designed and fabricated. Experimental results of interferometric
CGH-null test are presented.
Paper Details
Date Published: 12 March 2008
PDF: 8 pages
Proc. SPIE 6624, International Symposium on Photoelectronic Detection and Imaging 2007: Optoelectronic System Design, Manufacturing, and Testing, 66240K (12 March 2008); doi: 10.1117/12.791080
Published in SPIE Proceedings Vol. 6624:
International Symposium on Photoelectronic Detection and Imaging 2007: Optoelectronic System Design, Manufacturing, and Testing
Liwei Zhou, Editor(s)
PDF: 8 pages
Proc. SPIE 6624, International Symposium on Photoelectronic Detection and Imaging 2007: Optoelectronic System Design, Manufacturing, and Testing, 66240K (12 March 2008); doi: 10.1117/12.791080
Show Author Affiliations
Guo guo Kang, Beijing Institute of Technology (China)
Jing-hui Xie, Beijing Institute of Technology (China)
Jing-hui Xie, Beijing Institute of Technology (China)
Yi Liu, China Precision Engineering Institute for Aircraft Industry (China)
Published in SPIE Proceedings Vol. 6624:
International Symposium on Photoelectronic Detection and Imaging 2007: Optoelectronic System Design, Manufacturing, and Testing
Liwei Zhou, Editor(s)
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