
Proceedings Paper
EUV near normal incidence collector development at SAGEMFormat | Member Price | Non-Member Price |
---|---|---|
$17.00 | $21.00 |
Paper Abstract
Through its participation to European programs, SAGEM has worked on the design and manufacturing of normal
incidence collectors for EUV sources. By opposition to grazing incidence, normal incidence collectors are expected to
collect more light with a simpler and cheaper design. Designs are presented for the two current types of existing sources:
Discharge Produced Plasma (DPP) and Laser Produced Plasma (LPP). Collection efficiency is calculated in both cases. It
is shown that these collectors can achieve about 10 % efficiency for DPP sources and 40 % for LPP sources. SAGEM
works on the collectors manufacturability are also presented, including polishing, coating and cooling. The feasibility of
polishing has been demonstrated with a roughness better than 2 angstroms obtained on several materials (glass, silicon,
Silicon Carbide, metals...). SAGEM is currently working with the Institut d'Optique and the Laboratoire des Materiaux
Avancés on the design and the process of EUV coatings for large mirrors. Lastly, SAGEM has studied the design and
feasibility of an efficient thermal control, based on a liquid cooling through slim channels machined close to the optical
surface.
Paper Details
Date Published: 3 April 2008
PDF: 11 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 692135 (3 April 2008); doi: 10.1117/12.787620
Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)
PDF: 11 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 692135 (3 April 2008); doi: 10.1117/12.787620
Show Author Affiliations
R. Mercier Ythier, SAGEM-REOSC (France)
X. Bozec, SAGEM-REOSC (France)
R. Geyl, SAGEM-REOSC (France)
A. Rinchet, SAGEM-REOSC (France)
Christophe Hecquet, Lab. Charles Fabry de l'Institut d'Optique, Univ. Paris-Sud (France)
Marie-Françoise Ravet-Krill, Lab. Charles Fabry de l'Institut d'Optique, Univ. Paris-Sud (France)
Franck Delmotte, Lab. Charles Fabry de l'Institut d'Optique, Univ. Paris-Sud (France)
Benoît Sassolas, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
X. Bozec, SAGEM-REOSC (France)
R. Geyl, SAGEM-REOSC (France)
A. Rinchet, SAGEM-REOSC (France)
Christophe Hecquet, Lab. Charles Fabry de l'Institut d'Optique, Univ. Paris-Sud (France)
Marie-Françoise Ravet-Krill, Lab. Charles Fabry de l'Institut d'Optique, Univ. Paris-Sud (France)
Franck Delmotte, Lab. Charles Fabry de l'Institut d'Optique, Univ. Paris-Sud (France)
Benoît Sassolas, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
Raffaele Flaminio, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
Jean-Marie Mackowski, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
Christophe Michel, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
Jean-Luc Montorio, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
Nazario Morgado, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
Laurent Pinard, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
Elodie Roméo, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
Jean-Marie Mackowski, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
Christophe Michel, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
Jean-Luc Montorio, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
Nazario Morgado, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
Laurent Pinard, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
Elodie Roméo, Lab. des Matériaux Avancés, Univ. Claude Bernard Lyon I (France)
Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)
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