The combination of electron beam lithography (EBL) and x-ray lithography (XRL) has been developed to successfully fabricate x-ray transmittive diffractive optical elements (DOE) such as Fresnel zone plates (FZP) and transmittive gratings (TG). In fabrication processes, the master masks of FZP and TG were patterned with high resolution on free standing membranes by EBL and followed by electroplating. Subsequently, the final gold FZP and TG with vertical cross section were efficiently and economically replicated by XRL and electroplating. By using this combined method, FZP based on silicon nitride (SiNx) free standing membrane was achieved with 150 nm width of outermost ring and 6.7 high aspect ratio, due to a novel sandwich resist structure. A series of TG master masks (2000 g/mm, 3333 g/mm, and 5000 g/mm) were fabricated by EBL. Furthermore, final gold TGs with 2000 g/mm and 3333 g/mm were replicated by XRL. The spectrum of 2000 g/mm TG has shown its perfect performance in x-ray spectroscopy.

Date Published: 14 November 2007
PDF: 7 pages
Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 672208 (14 November 2007);

Published in SPIE Proceedings Vol. 6722:
3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Yaolong Chen; Ernst-Bernhard Kley; Rongbin Li, Editor(s)