The volume of measurements and the complexity of metrology recipes in state-of-the-art semiconductor manufacturing have made the conventional manual process of creating the recipes increasingly problematic. To address these challenges, we implemented a system for automatically creating production metrology recipes. We present results from the use of this system for CD-SEM and overlay tools in a high-volume manufacturing environment and show that, in addition to the benefits of reduced engineering time and improved tool utilization, recipes produced by the automated system are in many respects more robust than the equivalent manually created recipes.

Date Published: 24 March 2008
PDF: 10 pages
Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69221J (24 March 2008); doi: 10.1117/12.773407

Published in SPIE Proceedings Vol. 6922:
Metrology, Inspection, and Process Control for Microlithography XXII
John A. Allgair; Christopher J. Raymond, Editor(s)