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Proceedings Paper

Characterization of resist and topcoat properties for immersion lithography
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Paper Abstract

For this paper, we have performed a fundamental characterization of various resists and topcoats supplied by different vendors. The resists and topcoats were selected based on the inherent properties of these chemicals (elemental composition, contact angle, etc.). The goal of this study is to better understand the resist and topcoat interaction under various process conditions. We have characterized these materials using a number of analytical techniques such as atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). We have also provided data on the effect of the constitution of the resist and topcoat materials on the resist profile, under both dry and immersion exposure.

Paper Details

Date Published: 4 April 2008
PDF: 10 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 692320 (4 April 2008); doi: 10.1117/12.773318
Show Author Affiliations
Kaveri Jain, Micron Technology, Inc. (United States)
Yoshi Hishiro, Micron Technology, Inc. (United States)

Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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